INTERACTION OF MULTI-FIELD COUPLED LOW TEMPERATURE PLASMA WITH MICRO AND NANO STRUCTURED MATERIALS

Low-temperature plasma is one of the most important methods for preparing micro-nano particle materials and regulating their structure and properties. The changes of material structure and properties results from the coupling of plasma electromagnetic field, thermal field, and chemical field. This paper systematically and briefly reviews the following main contents: the influence of the frequency of the power supply, its modulation and application mode on the characteristics and stability of plasma discharge; Physicochemical reaction kinetics of plasma at atmospheric pressure; The influence of plasma field on the aggregation structure and motion of micro-nano particles and the micro-nano structure of deposited films. The main conclusions are summarized as follows: frequency, pulse modulation and capacitive or inductive coupling type, monomer composition etc., have a major impact on the composition and characteristics of active plasma species. A stable discharge can be achieved in the range of kHz ~ MHz for the micro-nano particle preparation and thin film deposition. Microparticles can be levitated at the sheath and form a 2D particle suspension with crystalline and amorphous structure. The low-temperature plasma multi-field modulation can quickly achieve the crystallization of micro-nano particles, and regulate the composition, scale, crystallinity, band gap, crystal type, crystal surface ratio and morphology characteristics of micro-nano film. By introducing the microparticles suspended in the sheath to form regular two-dimensional plasma lattices and disordered plasma amorphous crystals, the structure and kinetics of complex systems are studied at mesoscale.