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Zhenkun Lei, Hai Yun. Theoretical analysis of T-stress effects on photoelastic fringe patterns in cracks[J]. Chinese Journal of Theoretical and Applied Mechanics, 2010, 42(3): 482-490. DOI: 10.6052/0459-1879-2010-3-2008-565
Citation: Zhenkun Lei, Hai Yun. Theoretical analysis of T-stress effects on photoelastic fringe patterns in cracks[J]. Chinese Journal of Theoretical and Applied Mechanics, 2010, 42(3): 482-490. DOI: 10.6052/0459-1879-2010-3-2008-565

Theoretical analysis of T-stress effects on photoelastic fringe patterns in cracks

  • Received Date: September 15, 2008
  • Revised Date: February 22, 2009
  • Based on the multi-parameter mathematic model of theelastic stress field near a crack-tip, the influences of the stressintensity factors K_{\rm I}, K_{\rm II}, and T-stress on thephotoelastic isochromaticand isoclinic fringe patterns are presented for the mode I, mode II andmixed mode I/II crack, respectively. It is confirmed that T-stressinfluences the radius and rotate direction of the isochromatic fringe loops.The rotated angle of the loop only relates to the T-stress for the mode I orII crack, while to the intensity factors K_{\rm I}, K_{\rm II}, and T-stress for themixed mode I/II crack. There are two isotropic points along ±π/3directions in the mode I crack under positive T-stress, while none ofisotropic point under the negative T-stress. For the mode II crack only oneisotropic point appears behind the crack-tip under T-stress. For the mixedI/II crack, three isotropic points with different radius appear at thecorresponding positions under the positive T-stress, however, one pointexists behind the crack-tip for the negative T-stress. Thses isotropic pointsfor the mixed I/II crack comply with rules in the mode I and mode II,respectively.
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