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中文核心期刊

空气−悬浮液驱替条件下颗粒边壁滞留研究

STUDY ON WALL DEPOSITION OF PARTICLES DURING GAS−SUSPENSION DISPLACEMENT

  • 摘要: 研究气−液−颗粒多相流动过程中颗粒的边壁滞留行为对多孔介质堵塞控制、污染物运移与修复、材料表面改性等应用具有重要意义. 为探究颗粒滞留机理, 首先基于自主研发的多相流可视化实验装置, 在Hele-Shaw模型中开展了不同流量、板间距和颗粒粒径条件下空气驱替颗粒悬浮液实验, 并定义了滞留系数来对颗粒滞留进行定量评价, 发现了驱替过程中颗粒的不同滞留模式. 在实验基础上, 基于液膜理论和气−液界面处流场特征分析, 提出了以毛细数和间距粒径比为控制参数的颗粒滞留判别准则, 并与实验结果进行了对比验证. 结果表明: 空气−悬浮液驱替流动过程中颗粒滞留存在无滞留、成簇滞留及均匀分散滞留3种模式, 其与流量、板间距和颗粒粒径等因素有关; 随着流量的增加、板间距的增大或粒径的减小, 颗粒从无滞留模式向成簇滞留模式和均匀分散滞留模式转变, 颗粒滞留系数表现为先从零快速增大而后趋于稳定的变化趋势. 边壁上残留的液体薄膜是颗粒滞留发生的必要条件, 其中界面驻点处液膜厚度等于颗粒半径为颗粒成簇滞留的临界几何条件, 而界面驻点处液膜厚度等于2倍颗粒半径为颗粒均匀分散滞留的临界几何条件. 提出的判别准则预测了颗粒滞留的发生及滞留模式的转变, 揭示了受水动力条件和间距粒径比控制的颗粒滞留机制.

     

    Abstract: Particle deposition in gas−liquid−particle multiphase flow is of great significance for applications including clogging control, contamination remediation, material surface modification. In order to explore the mechanism of particle deposition, we set up a visualization experimental system of multiphase flow, and carried out gas−suspension displacement experiments in the Hele-Shaw cell under different controlling conditions of flow rates, gaps and particle sizes. A deposition coefficient is defined to quantitatively evaluate the particle deposition. It is found that different particle deposition patterns emerge during the displacement process. Building on the experimental findings, a particle deposition criterion, which takes the capillary number and the ratio of gap to particle size as control parameters, is proposed based on the liquid film theory and the flow field analysis at the gas−liquid interface. The criterion is compared and verified against the experimental results. The results show that there are three particle deposition patterns during the gas−suspension displacement process: no deposition, cluster deposition and uniform deposition, which are influenced by the flow rate, gap and particle size. As the flow rate and gap increase or the particle size decreases, the particle deposition pattern transitions from no deposition to cluster deposition and uniform deposition, and the particle deposition coefficient shows a trend of first rapid increase from zero, followed by stabilization. The residual liquid film on the wall is a necessary condition for the occurrence of the particle deposition. The critical geometric condition for the particle cluster deposition is the liquid film thickness at the interface stagnation point equal to the particle radius, and that for the particle uniform deposition is the liquid film thickness at the interface stagnation point equal to twice the particle radius. The proposed criterion accurately predicts the occurrence of particle deposition and the transition of deposition patterns, elucidating the controlling mechanism of particle deposition by the hydrodynamic condition and the ratio of gap to particle size.

     

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