磁场力及膜曲率对磁敏感薄膜-基底界面 黏附性能的影响与调控1)
INFLUENCE AND REGULATION OF INTERFACIAL ADHESION PROPERTIES OF A MAGNETIC SENSITIVE FILM/SUBSTRATE BY MAGNETIC FORCE AND FILM'S CURVATURE1)
磁场力及膜曲率对磁敏感薄膜-基底界面 黏附性能的影响与调控1) |
| 韩明杰, 彭志龙, 姚寅, 张博, 陈少华 |
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INFLUENCE AND REGULATION OF INTERFACIAL ADHESION PROPERTIES OF A MAGNETIC SENSITIVE FILM/SUBSTRATE BY MAGNETIC FORCE AND FILM'S CURVATURE1) |
| Han Mingjie, Peng Zhilong, Yao Yin, Zhang Bo, Chen Shaohua |
| 图10 (a)黏附机械抓手; (b)通过预压力使薄膜与硅片完全接触; (c)撤去预压力后无磁场时薄膜从硅片基底上自发脱黏; (d) $\sim$ (f)磁场作用下薄膜靠近硅片过程中曲率逐渐减小; (g)硅片被拾取; (h)薄膜与硅片界面开始脱黏; (i)硅片从薄膜上完全释放 |
| Fig.10 (a) Adhesively mechanical gripper; (b) film completely contact with the silicon substrate through a preload; (c) film detaches from the substrate spontaneously without the action of magnetic field after removing the preload; (d) $\sim$ (f) curvature of the film decreases with decreasing the separation between the film and substrate with the action of magnetic field; (g) gripping the silicon substrate; (h) initial detachment of the interface; (i) complete detachment of the silicon from the film |
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