利用维氏和玻氏压头表征半导体材料断裂韧性1)
刘明, 侯冬杨, 高诚辉

STUDY ON FRACTURE TOUGHNESS OF SEMICONDUCTOR MATERIAL USING VICKERS AND BERKOVICH INDENTERS1)
Liu Ming, Hou Dongyang, Gao Chenghui
图1 单晶硅和碳化硅维氏和玻氏压痕的光学图片
Fig.1 Optical micrographs of the Vickers and Berkovich indentation for Si (111) and 4H-SiC